Prof. Jane P. Chang

POSTDOCTORAL RESEARCHERS Lab Phone: (310) 794-4763


		Yuanbing Mao, Ph.D. Synthesis and Characterization of Metal Oxide Nano-structures Metal oxide nanostructures are fabricated by liquid-phase and/or gas-phase synthetic routes, for their electronic, optoelectronic, and chemical sensing applications. The micro-structure, morphology, and composition of the metal oxide nanosturctures are characterized by various spectroscopic and microscopic techniques. Simple and novel device structures are built to validate the correspondingly improved device functionality due to the reduced dimension of these materials.







	GRADUATE STUDENTS Lab Phone: (310) 794-4763











		John Hoang Sensitizer co-doped Er:Y2O3 Thin Films for Optical Applications Synthesis of spatially controlled rare-earth co-doped metal oxide thin films by radical enhanced atomic layer deposition. Carrying out room temperature photoluminescence (PL) and extended X-ray absorption fine structure (EXAFS) analysis to explain the effects of ion proximity on the 1.54 µm emission. Various waveguide geometries will be explored to study scattering losses at the core cladding interface and the bending radii limits of Yb co-doped Er:Y2O3.

		James Dorman Multifunctional Metal Oxide Nanostructures Metal oxides constitute a versatile class of functional materials ranging from metals to semiconductors and insulators, thus have numerous applications in various technologically advanced fields including microelectronics, optoelectronics, photonics, spintronics, and sensors. Their material property and device functionality can be tailored by controlling their composition, microstructure, and surface functionalization, especially when they are synthesized as nanostructures.

		Ya-Chuan Sandy Perng Engineering Epitaxial Metal Oxides on Wide Bandgap Semiconductors An atomic layer deposition process is developed to engineer metal oxide thin films on wide band gap semiconductors for power electronics application. The composition and microstructures of these heterojunctions are investigated, experimentally and theoretically, to elucidate their effects on the device’s electrical performance.

		Nathan Marchack Plasma Patterning of Complex Materials Study the gas-phase and surface reactions during a high density plasma etching of metal/metal oxide/semiconductor thin film stacks thought the use of various gas-phase diagnostics (laser interferometry, OES, QMS, IR, Langmuir probe) and surface analysis (IR, XPS, ellipsometry).

		Jingyan (Leo) Li Deposition of Functionally Engineered Dielectric Thin Films To increase the performance of ultra-large scale integrated circuits (ULSI), an integrated processing system is used to synthesize functionally engineered dielectric thin films with atomically controlled deposition processes on various semiconductor surfaces, with a focus on the effect of composition and interface engineering
UNDERGRADUATE STUDENTS

		Stephanie Gachot Synthesis and Characterization of Metal Silicide Nanoparticles Metal silicide nanostructures are fabricated by liquid-phase synthetic routes for their electronic applications. The micro-structure, morphology, and composition of the metal silicide nanosturctures are characterized by various spectroscopic and microscopic techniques.

		Calvin Pham Feature Profile Evolution in High-density Plasma Etching Study the evolution of feature profiles during high density plasma etching of thin films. The electron temperature, plasma density, ion energy and its distribution and angular dispersion as determined by Langmuir probe and ion energy analyzer are implemented in a Monte Carlo simulator, coupled with reaction kinetic models, to simulate the effect of ions, radicals, and their energy and angle of incident on the evolution of profiles during plasma etching processes.




HIGH SCHOOL INTERNS



FORMER STUDENTS

		Ashley Armenta Characterization of the Electronic and Electrical Properties of Metal Oxides Mayfield Senior School, Pasadena, CA
		Caroline Barron (High School Student) Marborough High School, Los Angeles, Ca
		Brett Berens (undergraduate) X-ray Photoelectron Spectroscopy Study of Plasma Etched Metal Oxides and Device Testing
		Tara Chang (high school intern) Simulation of a Cylindrical Ion Trap as a Micro-Chemical Analyzer Marlborough High School, Los Angeles, CA. Currently: MIT

		Byeong-Ok Cho, Ph.D. (postdoctoral researcher) Spectroscopic Studies of Plasma Enhanced Chemical Vapor Deposition (PECVD) Currently: Samsung Electronics, Korea
		Jongwoo Choi, Ph.D. (postdoctoral researcher) Spectroscopic Studies of Dielectric/Semiconductor Interfaces Currently: GE Research, New York
		Karen Chu (masters student) Electrical Characterization of Carbon-Doped Ta2O5 Films for Embedded DRAM Applications Currently: Nanomix, Inc., California
		Kimberly Cross (masters student) Surface Chemistry of Organometallic Precursors Currently: University of California, Los Angeles
		Dolores Cruz Chemical Microelectromechanical Systems Currently: Intel Corporation, California
		Kelly Halford (high school intern) Microfluidics Mayfield Senior School, Pasadena, CA. Currently: Princeton University
		Chengche (Jerry) Hsu, Ph.D. (Post Doc) High Density Plamsa Diagnostics and Simulation Currently: National Taiwan University, Taiwan
		Vladan Jankovic (masters student) FET-based Microchemical Sensors Employing HfO2 and ZrO2 Currently: Northrop Grumman Corporation, California
		John Keagy (undergraduate) Solid State Electronic Device Fabrication Currently: Graduate Student, UT Austin
		Angela Ku (high school intern) High Density Plasma Etching Processes Mayfield Senior School, Pasadena, CA. Currently: Yale University
		Sandy Lao (masters student) Investigation of Plasma Enhanced Deposition of Zirconium Oxide and Hafnium Oxide Thin Films Currently: Intel Corporation, Arizona
		Vu Le (masters student) Plasma Reactor Scale Modeling Currently: Matech Advanced Materials, Westlake Village
		Shirley Lee (undergraduate) Infrared Spectroscopy of Thin Film Analysis Currently: Graduate Student, UC Irvine
		Jasmine Lin (undergraduate) Diagnostic instrumentation on an ECR reactor for thin film deposition Currently: Process Development Engineer, Novellus Systems, Inc.
		You-Sheng (Wilson) Lin, Ph.D. (Ph.D. student) Synthesis and Integration of High-k Dielectric Materials Currently: Engineer, UCLA Nanoelectronics Research Facility
		Jiurong Liu, Ph.D. Material and Electrical Characterization of Metal Oxides Synthesized by Plasma Enhanced Atomic Layer Deposition Currently:
		Ryan Martin (Ph.D. Student) High Density Plasma Enhanced Patterning of Metal Oxides Currently: IBM, New York
		Monica Sawkar, Ph.D. (Ph.D. Student) Deposition of Functionally Engineered Dielectric Thin Films Currently: Intermolecular, San Jose
		Chris McCormick (undergraduate) First-Principles Study of Silicon Carbide, a promising wide band gap semiconductor Currently: Graduate Student, Stanford

		Ragesh Puthenkovilakam, Ph.D. (Ph.D. student) Experimental and Theoretical Studies of High-k Dielectrics on Silicon Currently: Intel Corporation, Oregon
		Desiree Ramirez (masters student) Ion-enhanced Chemical Etching of Metal Oxides in Chlorine Based Plasmas Currently: Accenture, California
		Phedellee Reyer (high school intern) Process for Creating Complimentary Metal-Oxide-Semiconductors (CMOS) Mayfield Senior School, Pasadena, CA. Currently: University of California, Irvine
		Lin Sha, Ph.D. (Ph.D. student) Plasma Enhanced Etching of Metal Oxides Currently: Intel Corporation, Oregon
		Yen Ta (masters student) X-ray photoelectron spectroscopic analysis of halogen etched metal oxide films Currently: Analog Device, California
		Melat Tafesse Microstructures of Ultra-thin Dielectric Films Currently: Micron, Virginia

			Carey Tanner, Ph.D. (Ph.D. Student) Engineering Compositionally Controlled Crystalline Metal Oxides on Wide Bandgap Semiconductors Currently: Luna Nanoworks, Virginia
			Trinh Tu Van, Ph.D. (Ph.D. Student) Molecular Beam Simulation of Surface Kinetics Currently: Intel Corporation, Oregon
			Nicky Virdone (high school intern) Optical emission analysis of plasma processing Mayfield Senior School, Pasadena, CA. Currently: UCLA
			Jianjun Wang (masters student) High Density Plasma Enhanced Deposition of Metal Oxides

	Group Photos
	2000-2001

	2001-2002

	2002-2003

	2003-2004