Electronic Materials Synthesis and Plasma Processing Lab

Chang Lab - Group Members

POSTDOCTORAL RESEARCHERS

Lab Phone: (310) 983-3308
 
 

Taesung Kim, PhD.


Magnetic metal alloy etching for MRAM applications

 

Investigate the etching of magnetic transition metals for MRAM device fabrication, as well as the theoretical calculation of the volatility of the etching products.


GRADUATE STUDENTS

Lab Phone: (310) 983-3308







Nicholas Altieri


 







Jeffrey Chang






Jack Chen

 


Cyrus Cheung

 

 




Diana Chien
 

Jea (Jay) Cho

 

Ultra-thin ion conductive films as solid electrolytes for energy storage  

Utilize atomic layer deposition to control the composition, microstructure, morphology, and fabrication of ultra-thin solid electrolytes for solid oxide fuel cell and Li-ion battery, especially in microelectromechanical systems (MEMS) based micro-power systems.  Assess the improvement in power density per foot print by using conformal ALD coatings to realize the high density integration in 3-D device structures

 

Calvin Pham

 

Atomic layer deposition of complex metal oxides

Assess the effect of composition and spatial distribution of elements in the multiferroics on their magnetoelectricity, thereby enabling a rational design of an optimal material.  Use atomic layer deposition to realize highly conformality synthetic multi-ferroic materials at low temperatures to form strongly coupled interfaces needed to achieve magnetoelectricity. 



Colin Rementer











Trevor Seegmiller





UNDERGRADUATE STUDENTS



















HIGH SCHOOL INTERNS

       










FORMER GROUP MEMBERS




 

Younghee Kim, PhD.


 



Michael Paine (undergraduate)
Plasma Processing
Institution: UCLA, Class of 2014







Juan Casillas (TAMNS undegraduate)
PZT
Institution: UCLA, Class of 2014







Edward McAboy (TAMNS undergraduate)
Multiferroics
Institution: UCLA, Class of 2015







Taylor Evanko (undergraduate)
CoFeB
Institution: UCLA, Class of 2015


 





 

Vladan Jankovic

Core-shell nanostructures for plasmonics 

Currently: Northrop Grumman, California



 

Nathan Marchack

Plasma Patterning of Complex Materials

Currently: IBM, New York






 

Ya-Chuan (Sandy) Perng

Engineering Epitaxial Metal Oxides on Wide Bandgap Semiconductors
Currently: Intel Corporation, Oregon







 

Kristen Fernhoff

Comparison of intrinsic and engineered multi-ferroic materials 

Currently: Washington University in St Louis








James Dorman
Multifunctional Metal Oxide Nanostructures
Currently: Universitaet Konstanz in Germany








Han Chueh 
Density functional theory study of complex metal oxides
Currently: UCLA





 

Ashley Armenta

Characterization of the Electronic and Electrical Properties of Metal Oxides

Mayfield Senior School, Pasadena, CA

 

 

     

 

Katia Ameri  (High School Intern)

Marlborough School, Los Angeles, Ca

Electrochemistry Study for Micro-Lithium Ion Batteries

Currently: Stanford University

     


Brett Berens (undergraduate)

X-ray Photoelectron Spectroscopy Study of Plasma Etched Metal Oxides and
Device Testing

 

 

Tara Chang (High School Intern)

Simulation of a Cylindrical Ion Trap as a Micro-Chemical Analyzer

Marlborough High School, Los Angeles, CA.

Currently: MIT





Byeong-Ok Cho, Ph.D. (postdoctoral researcher)
Spectroscopic Studies of Plasma Enhanced Chemical Vapor Deposition (PECVD)
Currently: Samsung Electronics, Korea

 


Jongwoo Choi, Ph.D. (postdoctoral researcher)
Spectroscopic Studies of Dielectric/Semiconductor Interfaces

Currently: GE Research, New York

 


Karen Chu (Masters Student)
 Electrical Characterization of Carbon-Doped Ta2O5 Films for Embedded DRAM Applications
Currently: Nanomix, Inc., California



Kimberly Cross (Masters Student)
 Surface Chemistry of Organometallic Precursors

Currently: University of California, Los Angeles



Dolores Cruz (Ph.D Student)

Chemical Microelectromechanical Systems  

Currently: Intel Corporation, California

 

 

Carissa Eisler (Undergraduate)
Analysis of Ultra-Thin Films and Interfaces by Extended X-Ray Absorption Fine Structure (EXAFS).

Currently : California Institute of Technology (Caltech)





Kelly Halford (High School Intern)

Microfluidics
Mayfield Senior School, Pasadena, CA.
Currently: Princeton University

 

 

John Hoang

Sensitizer co-doped Er:Y2O3 Thin Films for Optical Applications

Currently: National Institute of Standards and Technology


Jerry's picture


Chengche (Jerry) Hsu, Ph.D. (Post Doc)

High Density Plamsa Diagnostics and Simulation

Currently: National Taiwan University, Taiwan



Vladan Jankovic (Masters Student)
FET-based Microchemical Sensors Employing HfO2 and ZrO2

Currently: Northrop Grumman Corporation, California






John Keagy (undergraduate)
Solid State Electronic Device Fabrication
Currently: Graduate Student, UT Austin

 



Angela Ku (High School Intern)
High Density Plasma Etching Processes

Mayfield Senior School, Pasadena, CA.
Currently: Yale University

 


Sandy Lao (Masters Student)
Investigation of Plasma Enhanced Deposition of Zirconium Oxide and Hafnium Oxide Thin Films
Currently: Intel Corporation, Arizona

 


Jingyan (Leo) Li (Masters Student)

Deposition of Functionally Engineered Dielectric Thin Films

Currently: Intel Corporation, New Mexico

 


 

Vu Le (Masters Student)

Plasma Reactor Scale Modeling

Currently: Matech Advanced Materials, Westlake Village

 



Shirley Lee (undergraduate)
Infrared Spectroscopy of Thin Film Analysis
Currently: Graduate Student, UC Irvine



 




Jasmine Lin (undergraduate)

Diagnostic instrumentation on an ECR reactor for thin film deposition
Currently: Process Development Engineer, Novellus Systems, Inc.



 




You-Sheng (Wilson) Lin, Ph.D. (Ph.D. student)

Synthesis and Integration of High-k Dielectric Materials
Currently: Engineer, UCLA Nanoelectronics Research Facility

     

 

Jiurong Liu, Ph.D. (Post-Doc)

Material and Electrical Characterization of Metal Oxides Synthesized by Plasma Enhanced Atomic Layer Deposition

Currently: School of Material Science & Engineering,

                 Shandong University, China

     

 

Ryan Martin, Ph.D. (Ph.D. Student)

High Density Plasma Enhanced Patterning of Metal Oxides

Currently: IBM, New York
     

 

Monica Sawkar-Mathur, Ph.D. (Ph.D. Student)

Deposition of Functionally Engineered Dielectric Thin Films

Currently: Intermolecular, San Jose

     

 

Yuanbing Mao, Ph.D. (Post-Doc)

Synthesis and Characterization of Metal Oxide Nano-structures

Currently: University of Texas, Pan American
     

 

Chris McCormick (undergraduate)
First-Principles Study of Silicon Carbide, a promising wide band gap semiconductor

Currently: Graduate Student, Stanford

 



Ragesh Puthenkovilakam, Ph.D. (Ph.D. student)
Experimental and Theoretical Studies of High-k Dielectrics on Silicon
Currently: Intel Corporation, Oregon

       
 


Desiree Ramirez (Masters Student)
Ion-enhanced Chemical Etching of Metal Oxides in Chlorine Based Plasmas
Currently: Accenture, California


     




Phedellee Reyer (High School Intern)
Process for Creating Complimentary Metal-Oxide-Semiconductors (CMOS)
Mayfield Senior School, Pasadena, CA.
Currently: University of California, Irvine

 



Lin Sha, Ph.D. (Ph.D. student)
Plasma Enhanced Etching of Metal Oxides
Currently: Intel Corporation, Oregon


       

 


Yen Ta (Masters Student)
X-ray photoelectron spectroscopic analysis of halogen etched metal oxide films
Currently: Analog Device, California

       



Melat Tafesse

Microstructures of Ultra-thin Dielectric Films

Currently: Micron, Virginia

   

Carey Tanner, Ph.D. (Ph.D. Student)
Engineering Compositionally Controlled Crystalline Metal Oxides on Wide Bandgap Semiconductors
Currently: Luna Nanoworks, Virginia

   

Trinh Tu Van, Ph.D. (Ph.D. Student)
Molecular Beam Simulation of Surface Kinetics
Currently: Intel Corporation, Oregon

   

Nicky Virdone (High School Intern)
Optical emission analysis of plasma processing

Mayfield Senior School, Pasadena, CA.
Currently: UCLA

   

Jianjun Wang (Masters Student)
High Density Plasma Enhanced Deposition of Metal Oxides 

Feng Zhang (Post-Doc)
Atomic Layer Deposition of Ferroelectric Thin Films on Wide Band Gap Semiconductors
Currently: Institute of Semiconductors, Chinese Academy of Science.

Stephanie Gachot (Masters Student) 

Synthesis and Characterization of Metal Silicide Nanoparticles

Currently: Intel Corporation, Arizona

Colleen Loynachan (Summer Intern)

Thin film electrolyte materials for solid oxide fuel cells

Currently: MIT

Hiroshi Yamamoto

 

 

Group Photos
2000-2001
   
2001-2002
   
2002-2003
   
2003-2004
   
2006-2007
   
2008-2009

   
2010-2011

   
2011-2012

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