POSTDOCTORAL
RESEARCHERS
Lab Phone: (310) 794-4763 |
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Yuanbing Mao, Ph.D.
Synthesis and Characterization of Metal
Oxide Nano-structures
Metal oxide nanostructures are fabricated by liquid-phase and/or
gas-phase synthetic routes, for their electronic, optoelectronic,
and chemical sensing applications. The micro-structure, morphology,
and composition of the metal oxide nanosturctures are characterized
by various spectroscopic and microscopic techniques. Simple and
novel device structures are built to validate the correspondingly
improved device functionality due to the reduced dimension of
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GRADUATE
STUDENTS
Lab Phone: (310) 794-4763
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John Hoang
Sensitizer co-doped Er:Y2O3 Thin Films for Optical Applications
Synthesis of spatially controlled rare-earth co-doped metal oxide thin films by radical enhanced atomic layer deposition. Carrying out room temperature photoluminescence (PL) and extended X-ray absorption fine structure (EXAFS) analysis to explain the effects of ion proximity on the 1.54 µm emission. Various waveguide geometries will be explored to study scattering losses at the core cladding interface and the bending radii limits of Yb co-doped Er:Y2O3.
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James Dorman
Multifunctional Metal Oxide Nanostructures
Metal oxides constitute a versatile class of functional materials ranging from metals to semiconductors and insulators, thus have numerous applications in various technologically advanced fields including microelectronics, optoelectronics, photonics, spintronics, and sensors. Their material property and device functionality can be tailored by controlling their composition, microstructure, and surface functionalization, especially when they are synthesized as nanostructures.
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Ya-Chuan Sandy Perng
Engineering Epitaxial Metal Oxides on Wide Bandgap Semiconductors
An atomic layer deposition process is developed to engineer metal oxide thin films on wide band gap semiconductors for power electronics application. The composition and microstructures of these heterojunctions are investigated, experimentally and theoretically, to elucidate their effects on the device’s electrical performance. |
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Nathan Marchack
Plasma Patterning of Complex Materials
Study the gas-phase and surface reactions during a high density plasma etching of metal/metal oxide/semiconductor thin film stacks thought the use of various gas-phase diagnostics (laser interferometry, OES, QMS, IR, Langmuir probe) and surface analysis (IR, XPS, ellipsometry).
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Jingyan (Leo) Li
Deposition of Functionally Engineered Dielectric Thin Films
To increase the performance of ultra-large scale integrated circuits (ULSI), an integrated processing system is used to synthesize functionally engineered dielectric thin films with atomically controlled deposition processes on various semiconductor surfaces, with a focus on the effect of composition and interface engineering
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UNDERGRADUATE STUDENTS
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Stephanie Gachot
Synthesis and Characterization of Metal Silicide Nanoparticles
Metal silicide nanostructures are fabricated by liquid-phase synthetic routes for their electronic applications. The micro-structure, morphology, and composition of the metal silicide nanosturctures are characterized by various spectroscopic and microscopic techniques. |
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Calvin Pham
Feature Profile Evolution in High-density Plasma Etching
Study the evolution of feature profiles during high density plasma etching of thin films. The electron temperature, plasma density, ion energy and its distribution and angular dispersion as determined by Langmuir probe and ion energy analyzer are implemented in a Monte Carlo simulator, coupled with reaction kinetic models, to simulate the effect of ions, radicals, and their energy and angle of incident on the evolution of profiles during plasma etching processes.
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HIGH SCHOOL INTERNS
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FORMER STUDENTS
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Ashley Armenta
Characterization of the Electronic
and Electrical Properties of Metal Oxides
Mayfield Senior School, Pasadena, CA
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Caroline Barron (High School Student)
Marborough High School, Los Angeles, Ca
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Brett Berens
(undergraduate)
X-ray Photoelectron Spectroscopy Study of Plasma
Etched Metal Oxides and
Device Testing
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Tara Chang (high school intern)
Simulation of a Cylindrical Ion Trap as
a Micro-Chemical Analyzer
Marlborough High School, Los Angeles, CA.
Currently: MIT
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Byeong-Ok Cho, Ph.D. (postdoctoral
researcher)
Spectroscopic Studies of Plasma Enhanced Chemical Vapor Deposition
(PECVD)
Currently: Samsung Electronics, Korea
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Jongwoo Choi, Ph.D.
(postdoctoral researcher)
Spectroscopic Studies of Dielectric/Semiconductor Interfaces
Currently: GE Research, New York |
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Karen Chu (masters student)
Electrical Characterization of Carbon-Doped
Ta2O5 Films for Embedded DRAM Applications
Currently: Nanomix, Inc., California
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Kimberly Cross (masters student)
Surface Chemistry
of Organometallic Precursors
Currently: University of California, Los Angeles |
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Dolores Cruz
Chemical Microelectromechanical Systems
Currently: Intel Corporation, California |
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Kelly Halford (high school intern)
Microfluidics
Mayfield Senior School, Pasadena, CA.
Currently: Princeton University
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Chengche (Jerry) Hsu, Ph.D. (Post Doc)
High Density Plamsa Diagnostics and Simulation
Currently: National Taiwan University, Taiwan |
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Vladan Jankovic (masters student)
FET-based Microchemical Sensors Employing HfO2 and ZrO2
Currently: Northrop Grumman Corporation, California |
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John Keagy (undergraduate)
Solid State Electronic Device Fabrication
Currently: Graduate Student, UT Austin
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Angela Ku (high school intern)
High Density Plasma Etching Processes
Mayfield Senior School, Pasadena, CA.
Currently: Yale University |
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Sandy
Lao (masters student)
Investigation of Plasma Enhanced Deposition of Zirconium
Oxide and Hafnium Oxide Thin Films
Currently: Intel Corporation, Arizona
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Vu Le (masters student)
Plasma Reactor Scale Modeling
Currently: Matech Advanced Materials, Westlake Village |
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Shirley Lee (undergraduate)
Infrared Spectroscopy of Thin Film Analysis
Currently: Graduate Student, UC Irvine
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Jasmine Lin (undergraduate)
Diagnostic instrumentation on an ECR reactor
for thin film deposition
Currently: Process Development Engineer, Novellus Systems, Inc.
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You-Sheng (Wilson) Lin, Ph.D. (Ph.D.
student)
Synthesis and Integration of High-k Dielectric
Materials
Currently: Engineer, UCLA Nanoelectronics Research Facility
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Jiurong Liu, Ph.D.
Material and Electrical Characterization
of Metal Oxides Synthesized by Plasma Enhanced Atomic Layer Deposition
Currently: |
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Ryan Martin (Ph.D. Student)
High Density Plasma Enhanced Patterning
of Metal Oxides
Currently: IBM, New York
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Monica Sawkar, Ph.D. (Ph.D. Student)
Deposition of Functionally
Engineered Dielectric Thin Films
Currently: Intermolecular, San Jose
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Chris McCormick (undergraduate)
First-Principles Study of Silicon Carbide, a promising wide band
gap semiconductor
Currently: Graduate Student, Stanford
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Ragesh Puthenkovilakam, Ph.D. (Ph.D.
student)
Experimental and Theoretical Studies of High-k Dielectrics on
Silicon
Currently: Intel Corporation, Oregon
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Desiree Ramirez
(masters student)
Ion-enhanced Chemical Etching of Metal Oxides in Chlorine
Based Plasmas
Currently: Accenture, California |
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Phedellee Reyer (high school intern)
Process for Creating Complimentary Metal-Oxide-Semiconductors
(CMOS)
Mayfield Senior School, Pasadena, CA.
Currently: University of California, Irvine
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Lin Sha, Ph.D.
(Ph.D. student)
Plasma Enhanced Etching of Metal Oxides
Currently: Intel Corporation, Oregon
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Yen Ta (masters
student)
X-ray photoelectron spectroscopic analysis of halogen
etched metal oxide films
Currently: Analog Device, California
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Melat Tafesse
Microstructures
of Ultra-thin Dielectric Films
Currently: Micron, Virginia
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