Models for weakly ionized plasma reactors, used in microelectronic
material manufacturing, are developed. Their numerical solutions are
pursued through finite difference schemes.
Investigation of plasma simulation is being carried out on the workstations at the Process Control and Design Laboratory. The graphs below give the flavour of simulation work in progress
Figure 1. Time-averaged electron temperature (eV)
Figure 2. Time-averaged plasma density (#/cm^3)
Figure 1. Time-averaged electron temperature (eV)
Figure 2. Time-averaged plasma density (#/cm^3)
Recent publications in this area:
Manousiouthakis & Wilcoxson
Manousiouthakis & Wilcoxson
Manousiouthakis & Wilcoxson
Information request by email
Back to Professor Manousiothakis' Homepage