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Research activities are focused on the synthesis and patterning of multi-functional complex oxide films with tailored electronic, chemical, thermal, mechanical, and biological properties. Experimental and theoretical studies are combined to understand the process chemistry and surface kinetics in atomic layer deposition, plasma etching and deposition processes, and gas-phase surface functionalization processes. Novel devices including advanced microelectronics, optoelectronics, and chemical sensors are realized at nano-dimensions as the technologies become more enabling based on these fundamental studies. ========================================================== [4/08] One postdoctoral research position is available in the area of electronic materials processing and plasma processing, with a focus on developing a feature scale model to predict the profile evolution during plasma assisted deposition and etching processes. Programming experience with C+ is required and some UHV experience is highly desirable as some experimental work is required for modeling confirmation. Candidates should have a Ph.D. in physics, chemistry, material science, chemical engineering or related areas and be skilled in technical writing.
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