|  Recent Presentations References with links to Abstracts
 
 
 Surface and bulk characterization of thermally induced defects 
				during silicon single wafer epitaxy,Petra Feichtinger, Mark S. Goorsky, Frank 
				Muemmler, Steve Rickborn, Quynh Tran, Dwain Oster and Jim Moreland, 2001 ICCG-13.
              	Re-distribution of 
				hydrogen during low temperature annealing of H-implanted Si, C. Miclaus, 
				M.S. Goorsky, Y.M. Kim, and Y.H.Xie, MRS 2001 Spring Meeting; nominated for the "Best Poster Award"
				Misfit dislocation density reduction of 
				InP-based pseudomorphic high electron mobility structures, M.Naidenkova, 
				R. Hsing, M.Goorsky, R. Sandhu, P. Chin, M. Wojtowicz, and T.Block, NA-MBE 2000
				 Misfit Dislocation Nucleation 
                Study in p/p+ Silicon, P. Feichtinger, M. S. Goorsky, D. Oster, 
                T. D'Silva, and J. Moreland, 198th Electrochemical 
                Society Meeting. 
				  Hydrophobic wafer 
				bonding using H+ implantation splitting 
                 C. Miclaus, M.S. Goorsky, Y.M. Kim, H.J. Kim, Y.H.Xie;
				 Department of Materials Science 
                and Engineering, University of California, Los Angeles; 
				2000 AACG West 17th 
                Conference on Crystal Growth and Epitaxy. 
                Effects of Sb Surfactant-Mediated 
                Growth on Dislocations in Si1-xGex 
                R. L. Forrest, M. S. Goorsky, Department of Materials Science 
                and Engineering, University of California, Los Angeles; 
				J. L. Liu, K. L. Wang, Device Research Laboratory, 
                Department of Electrical Engineering, University of California, 
                Los Angeles, 2000 AACG West 17th 
                Conference on Crystal Growth and Epitaxy. 
				 Misfit Dislocation 
                Interactions in Low Mismatch p/p+ Silicon Epitaxy, P. Feichtinger, 
                M.S. Goorsky, D. Oster, J. Chambers, and J. Moreland, 2000 XTOP 
                Conference. 
               Influence of Misfit 
                Dislocations on the Mobility in Pseudomorphic High Electron Mobility 
                Transistors Based on InxAl1-xAs / In0.75Ga0.25As 
                / InP Structures. R. Hsing, M. Naidenkova, and M.S. Goorsky, 
                R. Sandhu, M. Wojtowicz, T.P. Chin, T.R. Block, and D.C. Streit, 
                42nd 2000 Electronic Materials Conference. 
                 
                 The Role of Substrate 
                Miscut on Misfit Dislocation Interactions, P. Feichtinger, 
                B. Poust, M.S. Goorsky, Dept of Materials Science and Engineering, 
                University of California, Los Angeles; D. Oster, T. D'Silva, and 
                J. Moreland, 42nd 2000 Electronic Materials ConferenceSymposium: Point and Extended Defects in Mismatched Materials
 Carrier Transport in 
				Partially Relaxed In0.75Ga0.25As/InP High Electron Mobility Structures,
				R. Sandhu, R. Hsing, M. Naidenkova and M. S. Goorsky,  Dept of Materials 
				Science and Engineering, 
                University of California, Los Angeles; T.P. Chin, M. Wojtowicz, T. R. Block and 
				D. C. Streit, TRW, Redondo Beach, CA; 12th 2000 International 
				Indium Phosphide and Related Materials 2000
              
               Ion Implantation 
                Effect On Dislocation Propogation In Pseudomorphically Strained 
                p/p+ Silicon, P. Feichtinger, H. Fukuto, R. Sandhu, B. Poust, 
                and M.S. Goorsky, Dept of Materials Science and Engineering, University 
                of California, Los Angeles; D. Oster, S.F. Rickborn, and J. Moreland, 
                MRS 2000 Spring Meeting. 
               Structural Defects 
                in p/p+ Silicon Vapor Phase Epitaxy, 
                H. Fukuto, P. Feichtinger, M.S. Goorsky, T. Magee, D. Oster, and 
                J. Moreland, 1999 Spring Meeting of the Electrochemical Society. 
                 
               Effects of Strain Relaxation 
                on the Carrier Transport Properties on InP-based pseudomorphic 
                High Electron Mobility Structures, R.S. 
                Sandhu, C.D. Moore, M.S. Goorsky, L. Wong, H. Jiang, T.P. Chin, 
                M. Wojtowicz, T.R. Block, and D.C. Streit, 1999 Spring Meeting 
                of the Electrochemical Society.  
               Dynamics of Misfit Dislocation 
                Formation in p/p+ Vapor Phase Epitaxy, 
                P. Feichtinger, H. Fukuto, M.S. Goorsky, D. Oster, M. Rao, and 
                J. Moreland, MRS 1999 Spring Meeting. 
               Wafer Edge Misfit Dislocation 
                Nucleation in p/p+ Silicon Vapor Phase Epitaxy, 
                P. Feichtinger, H. Fukuto, M.S. Goorsky, D. Oster and J. Moreland, 
                1999 Electronic Materials Conference.  
               Order Parameter Determination 
                using High Resolution X-Ray Diffraction, 
                R.R. Hess, C.D. Moore. R.T. Nielsen and M.S. Goorsky, 9th 
                Biennial Workshop on Organometallic Vapor Phase Epitaxy.  
               Single and Double Variant 
                CuPt-B Ordered GaInAs, R. L. Forrest, 
                E. D. Meserole, R. T. Nielsen, M. S. Goorsky, Y. Zhang, A. Mascarenhas, 
                M. Hanna, S. Francoeur, MRS 1999 Fall Meeting. 
               Influence of the 
                Wafer Edge on Defect Formation in P/P+ Silicon Vapor Phase Epitaxy, 
                P. Feichtinger, B. Poust, H. Fukuto, M.S. Goorsky, D. Oster, J. 
                Chambers, and J. Moreland, MRS 1999 Fall Meeting.  
               Ion Implantation 
                and Misfit Dislocation Formation in P/P+Silicon, 
                P. Feichtinger, H. Fukuto, R. Sandhu, B. Poust, and M.S. Goorsky, 
                MRS 1999 Fall Meeting. 
    
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